BEGIN:VCALENDAR
VERSION:2.0
PRODID:-//Plone.org//NONSGML plone.app.event//EN
X-WR-TIMEZONE:Europe/Berlin
BEGIN:VEVENT
SUMMARY:CO2 Laserquelle für die EUV Lithografie
DTSTART;TZID=Europe/Berlin:20170626T161500
DTSTAMP:20260519T112233Z
UID:c9b3f8bc59e24ee18f352399ff3a3156@www.uni-marburg.de
CREATED:20200406T065048Z
DESCRIPTION:https://www.uni-marburg.de/en/grk1782/news/events/events-2017/
 co2-laserquelle-fur-die-euv-lithografie\nDr. Ajanth Velauthapillai\, Progr
 am Manager Lasersytems\, TRUMPF Lasersystems GmbH
LAST-MODIFIED:20200406T065128Z
LOCATION:Department of Physics\, Renthof 6\, seminar room 00014
URL:https://www.uni-marburg.de/en/grk1782/news/events/events-2017/co2-lase
 rquelle-fur-die-euv-lithografie
END:VEVENT
BEGIN:VTIMEZONE
TZID:Europe/Berlin
X-LIC-LOCATION:Europe/Berlin
BEGIN:DAYLIGHT
DTSTART:20170326T030000
TZNAME:CEST
TZOFFSETFROM:+0100
TZOFFSETTO:+0200
END:DAYLIGHT
END:VTIMEZONE
END:VCALENDAR